Ultrapure/DI water is used in large volumes throughout the semiconductor manufacturing process. The specifications for the DI water quality have become increasingly stringent over the years and the filter technology has evolved to meet these requirements.
Filters used to produce ultrapure water must do the following:
Product | Application |
---|---|
MBF™, STC™, or PMC™ | For pre RO applications, depth filters provide effective removal of sediments and particulates to prevent fouling of the RO membrane. 5 micron is most commonly used but finer filtration may be required based on water quality. For longer filter life, the pleated PMC series can be considered. |
ZTEC™ G or WaterTEC™, PMC™ or QMC™ |
DI resin trap – membrane or finely calendared melt blown filters trap any ion exchange resins that may be released from the resin bed. 0.2 or 0.45 micron recommended. |
ZTEC™ E | Pad prefiltration – highly consistent membrane filters provide protection of final point-of-use filters |
ZTEC™ E | Point-of-use cold DI – 0.03 micron ZTEC or 0.05 micron VTEC provide highly consistent performance at this critical process step |
TefTEC™ | Tank vents – hydrophobic PTFE membrane filters are recommended as tank vent filters to prevent the ingress of particulate or microbes into the stored water tanks. If a more economical solution is desired, consider use of PMA absolute rated pleated polypropylene filters. |
Gravex® Ion Exchange Resins | Low TOC, high purity Gravex ion exchange resins are available in anion, cation, and mixed bed formulations. |
ZTEC™ G, QXL™, PMC™, QMC™, STA™ | For recycling water after the tool, select the appropriate filter based on contaminants present in the water, before returning water to the DI process. |