This enhanced variant of chemical vapor deposition is used for creating high purity crystalline semiconducting thin films and micro/nano structures and is the industry leading technology used in LEDs, solar cells, and field effect transistors (FETs). However, the MOCVD processes (SiC, GaAs, GaN, other compound semiconductor) also produces powders and particulates when the exhaust gas flow to the low temperature (about 150 ℃) pipe and vacuum pump. The particulates can cause unexpected and significant damage to vacuum pumps. To protect the vacuum pumps, high performance filter is needed to catch small particles at high working temperature.
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